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  • 07/2022 - Installation

  • 11/2022 - Camera problem - no switching between overview and zoom

  • 06/2023 - Camera problem solved
  • 06/2024 - Focus (defoc) not working properly, contact HI, solved

Manuals

Documents

  • Resist Data Sheets:

  • Developer Data Sheet

Recepies

  • Recipe by
  • Oguzhan v1_2023
  • Recipe by Device Admin
    • AZ 1514 H (positive resist)

      • Spin Coating 4000rpm 4000 rpm / 60s 60 s / 500acc500 acc

      • Soft bake 50s @ 100°CBake 50 s @ 100 °C

      • Dose 135mJ135 mJ/cm²

      • Defoc -6
      • Develop 65 – 70s 70 s (AZ 726 MIF)

    • AZ 5214 E (reversal resist (positive mode))

      • Spin Coating 4000rpm 4000 rpm / 60s 60 s / 500acc500 acc

      • Soft bake 50s @ 110°CBake 50 s @ 110 °C

      • Dose 80 mJ/cm²

      • Defoc -6
      • Develop 55 – 70s 70 s (AZ 726 MIF)

    • AZ 5214 E (reversal mode resist (negative mode))

      • Spin Coating 4000rpm 4000 rpm / 60s 60 s / 500acc500 acc

      • Soft bake 50s @ 110°CBake 50 s @ 110 °C

      • Dose 90 mJ/cm²

      • Defoc -6
      • Reverse Bake 2 min @ 120 °Creverse bake 2min @ 120°C

      • Flood Exposure 30s 30 s @ 100% power Power (with KUB2)

      • Develop 55 – 70s (AZ 726 MIF)

    • ma-P1210 (for electrode size/distance 1:1)
      • Spin Coating 3000 rpm / 30 s / 500 acc

      • Soft bake 60 s @ 100 °C

      • Dose 82 mJ/cm²

      • Defoc -6
      • Develop 60 s (AZ 726 MIF)

    • ma-P1210 (for electrode size/distance 1:4)
      • Spin Coating 3000 rpm / 30 s / 500 acc

      • Soft bake 60 s @ 100 °C

      • Dose 87 mJ/cm²

      • Defoc -6
      • Develop 60 s (AZ 726 MIF)

  • Recipe by Oguzhan v1_2023