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Documents
Resist Data Sheets:
Developer Data Sheet
- AZ 726 MIF (SDS, TDS)
Recepies
- Recipe by Device Admin
AZ 1514 H (positive resist)
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 100 °C
Dose 135 mJ/cm²
- Defoc -6
Develop 65 – 70 s (AZ 726 MIF)
AZ 5214 E (reversal resist (positive mode))
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 110 °C
Dose 80 mJ/cm²
- Defoc -6
Develop 55 – 70 s (AZ 726 MIF)
AZ 5214 E (reversal resist (negative mode))
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 110 °C
Dose 90 mJ/cm²
- Defoc -6
Reverse Bake 2 min @ 120 °C
Flood Exposure 30 s @ 100% Power (with KUB2)
Develop 55 – 70s (AZ 726 MIF)
- ma-P1210 (for electrode size/distance 1:1)
Spin Coating 3000 rpm / 30 s / 500 acc
Soft bake 60 s @ 100 °C
Dose 82 mJ/cm²
- Defoc -6
Develop 60 s (AZ 726 MIF)
- ma-P1210 (for electrode size/distance 1:4)
Spin Coating 3000 rpm / 30 s / 500 acc
Soft bake 60 s @ 100 °C
Dose 87 mJ/cm²
- Defoc -6
Develop 60 s (AZ 726 MIF)
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