Direct Laserwriter for optical lithography (Fact Sheet)
Tabletop masklessaligner with raster scan modules
Tool for virtually any application requireing microstructures like microfluidics, small scale mask-writing, micro-optics, sensors, MEMS, contacting 2D materials and fan-out electrode, etc.
Raster scan exposure mode
Draw mode for straightforward adhoc modifications to exsiting structures and electrical contacts to nanowires or 2D materials
Greyscale exposure mode allows creation of complex structures such as micro-optical devices
Setup history
07/2022 - Installation
11/2022 - Camera problem - no switching between overview and zoom
- 06/2023 - Camera problem solved
- 06/2024 - Focus (defoc) not working properly, contact HI, solved
Manuals
Documents
Resist Data Sheets:
Developer Data Sheet
Recepies
- Recipe by Device Admin
AZ 1514 H (positive resist)
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 100 °C
Dose 135 mJ/cm²
- Defoc -6
Develop 65 – 70 s (AZ 726 MIF)
AZ 5214 E (reversal resist (positive mode))
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 110 °C
Dose 80 mJ/cm²
- Defoc -6
Develop 55 – 70 s (AZ 726 MIF)
AZ 5214 E (reversal resist (negative mode))
Spin Coating 4000 rpm / 60 s / 500 acc
Soft Bake 50 s @ 110 °C
Dose 90 mJ/cm²
- Defoc -6
Reverse Bake 2 min @ 120 °C
Flood Exposure 30 s @ 100% Power (with KUB2)
Develop 55 – 70s (AZ 726 MIF)
- ma-P1210 (for electrode size/distance 1:1)
Spin Coating 3000 rpm / 30 s / 500 acc
Soft bake 60 s @ 100 °C
Dose 82 mJ/cm²
- Defoc -6
Develop 60 s (AZ 726 MIF)
- ma-P1210 (for electrode size/distance 1:4)
Spin Coating 3000 rpm / 30 s / 500 acc
Soft bake 60 s @ 100 °C
Dose 87 mJ/cm²
- Defoc -6
Develop 60 s (AZ 726 MIF)
- Recipe by Oguzhan v1_2023
