Seitenhistorie

...

• Resist Data Sheets:

  • AZ 1512 (SDS, TDS)

  • AZ 5214E (SDS, TDS)

  • ma-P1210 (SDS, TDS)
  • TI-Prime (Adhesion) (SDS, TDS)

• Developer Data Sheet

  • AZ 726 MIF (SDS, TDS)

Recepies

• Recipe by Device Admin

  • AZ 1514 H (positive resist)

    • Spin Coating 4000 rpm / 60 s / 500 acc

    • Soft Bake 50 s @ 100 °C

    • Dose 135 mJ/cm²

    • Defoc -6

    • Develop 65 – 70 s (AZ 726 MIF)

  • AZ 5214 E (reversal resist (positive mode))

    • Spin Coating 4000 rpm / 60 s / 500 acc

    • Soft Bake 50 s @ 110 °C

    • Dose 80 mJ/cm²

    • Defoc -6

    • Develop 55 – 70 s (AZ 726 MIF)

  • AZ 5214 E (reversal resist (negative mode))

    • Spin Coating 4000 rpm / 60 s / 500 acc

    • Soft Bake 50 s @ 110 °C

    • Dose 90 mJ/cm²

    • Defoc -6

    • Reverse Bake 2 min @ 120 °C

    • Flood Exposure 30 s @ 100% Power (with KUB2)

    • Develop 55 – 70s (AZ 726 MIF)

  • ma-P1210 (for electrode size/distance 1:1)
    

    • Spin Coating 3000 rpm / 30 s / 500 acc

    • Soft bake 60 s @ 100 °C

    • Dose 82 mJ/cm²

    • Defoc -6

    • Develop 60 s (AZ 726 MIF)

  • ma-P1210 (for electrode size/distance 1:4)
    

    • Spin Coating 3000 rpm / 30 s / 500 acc

    • Soft bake 60 s @ 100 °C

    • Dose 87 mJ/cm²

    • Defoc -6

    • Develop 60 s (AZ 726 MIF)

...