Direct Laserwriter for optical lithography (Fact Sheet)
Tabletop masklessaligner with raster scan modules
Tool for virtually any application requireing microstructures like microfluidics, small scale mask-writing, micro-optics, sensors, MEMS, contacting 2D materials and fan-out electrode, etc.
Raster scan exposure mode
Draw mode for straightforward adhoc modifications to exsiting structures and electrical contacts to nanowires or 2D materials
Greyscale exposure mode allows creation of complex structures such as micro-optical devices
Setup history
Installation July 2022
11/2022 - Camera problem - no switching between overview and zoom
Manuals and Documents
Manual Operators Guide
Resist Data Sheets:
AZ 1500
AZ 5214E
Developer Data Sheet
Recepies
Recipe by Oguzhan v1_2023
AZ 1514 H (positive resist)
Spin Coating 4000rpm / 60s / 500acc
Soft bake 50s @ 100°C
Dose 135mJ/cm²
Develop 65 – 70s (AZ 726 MIF)
AZ 5214 E (positive mode)
Spin Coating 4000rpm / 60s / 500acc
Soft bake 50s @ 110°C
Dose 80 mJ/cm²
Develop 55 – 70s (AZ 726 MIF)
AZ 5214 E (reversal mode (negative))
Spin Coating 4000rpm / 60s / 500acc
Soft bake 50s @ 110°C
Dose 90 mJ/cm²
reverse bake 2min @ 120°C
Flood Exposure 30s @ 100% power (with KUB2)
Develop 55 – 70s (AZ 726 MIF)
